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An ion sputtering apparatus for thinning electron microscope specimens

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dc.contributor.author Corfiatis, Theo
dc.date.accessioned 2011-08-25T21:16:12Z
dc.date.accessioned 2022-10-30T18:54:02Z
dc.date.available 2011-08-25T21:16:12Z
dc.date.available 2022-10-30T18:54:02Z
dc.date.copyright 1987
dc.date.issued 1987
dc.identifier.uri https://ir.wgtn.ac.nz/handle/123456789/25920
dc.description.abstract An apparatus for the controlled erosion of metal surfaces by ion beam sputtering has been designed and constructed. The apparatus was tested in the preparation of thinned specimens from ion - implanted metals so that the microstructure could be examined using transmission electron microscopy (TEM). Specimens corresponding to different depths below the implanted surface were prepared by the ion erosion of the implanted surface to different depths prior to chemical backthinning the specimens to perforation in a jet electropolishing bath. In a particular study, four high purity Cu foil targets were irradiated at normal incidence with 200 keV D+ ions at a temperature of 120 K, to a dose of 1.75 X 10 17 D+ / cm2 (a level corresponding to 10 % of the critical dose for radiation blistering, Cb7 ). Argon - ion milling was used to remove 0.1 μm from the surface of the first target. The depths removed from the other targets were 0.5 μm, 1.0 μm and 2.0 μm respectively. Scanning electron microscopy (SEM) was used to examine the eroded surfaces. Surface artifacts resulting from D+ irradiation were evident on all four targets. Argon - ion milling seemed to enhance the production of surface artifacts. An explanation in terms of heating effects is advanced. Microcrystallites were observed on eroded surfaces. Although the mechanisms leading to their formation are not yet clear it is thought that they result from a synergism between the implantation produced microstructure and sputtering processes. Examination of the backthinned targets using TEM revealed the presence of a high dislocation density 10 10 or 10 11 cm-2. No gas bubbles were found. Moire interference fringes were observed on all four targets. These fringes were attributed to the presence of cuprous oxide on specimen surfaces. It was found that at magnifications above 5 x 10 5 lattice images corresponding to some crystal planes in copper and in cuprous oxide could be observed directly. en_NZ
dc.format pdf en_NZ
dc.language en_NZ
dc.language.iso en_NZ
dc.publisher Te Herenga Waka—Victoria University of Wellington en_NZ
dc.title An ion sputtering apparatus for thinning electron microscope specimens en_NZ
dc.type Text en_NZ
vuwschema.type.vuw Awarded Research Masters Thesis en_NZ
thesis.degree.discipline Physics en_NZ
thesis.degree.grantor Te Herenga Waka—Victoria University of Wellington en_NZ
thesis.degree.level Masters en_NZ


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